Matrix analysis, state variables, state space techniques for continuous time systems, matrix fraction descriptions. Controllability, observability, realization theory. Feedback and observers. Stability analysis.

Machine learning is the practice of programming computers to learn and improve prediction through experience and data, and it is becoming pervasive in technology and science. This course will cover the mathematical underpinnings, algorithms, and practices that enable a computer to learn. Topics will include supervised learning, unsupervised learning, evaluation methodologies, and deep learning. The prerequisites of this course include introductory courses in linear algebra (e.g ECE 201 or Math 235), multivariate calculus (e.g., Math 233), and probability (e.g., ECE 214).

Not available at this time

Analysis and design of passive microwave devices, including resonators, filters, and ferrite devices, in various transmission-line media. Noise and noise effects in detectors, mixers, and modulators. Introduction to FET amplifier design. Prerequisite: E&C-ENG 584.

Theory and applications of modern optoelectronic components such as waveguides and optical fibers, photodetectors, light emitting diodes, and semiconductor lasers. Emphasis on the physics and operating characteristics of optoelectronic semiconductor devices. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.