This course is the second part of a two semester project that is started in E&C-Eng 688F. The project can be design, experimental, simulation, or theoretical. The overall project grade is based on the project proposal, a final report, and a final presentation.

Students must have taken E&C-ENG 688F in order to enroll in this course.

Continuation of E&C-ENG 415. Design of small electronic system built, refined, tested, and demonstrated. Final prototype shown to meet initial specifications. Final design review. Prerequisite: E&C-ENG 415.

Course description not available at this time.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

With lab. Semiconductor instructional processing laboratory (SIPL) and lectures. Principles and practice of modern microelectronic silicon device processing. Theory and practice of basic processing technology including photo-lithography, oxidation, diffusion, thin film deposition, ion implantation, packaging, yield, and process integration. State-of-the-art laboratory fabrication of working microelectronic devices and process simulation techniques. Prerequisite: E&C-ENG 344.

Lecture, laboratory. Metrology fundamentals. Advanced microwave measurement techniques including error correction, de-embedding, and noise effects in amplifiers and oscillators. Prerequisites: familiarity with microwave CAD software, basic microwave theory.

This class covers the fundamental of the nanoelectronics discipline ranging from nanophysics, to nano structures and nanodevices. It provides first an overview of the fundamental physical principles required for understanding the electronic properties of matter at the nanoscale. From the basic description of quantum dots, wires and wells, we will review the main electrical property differences between atoms, molecules and nanostructures including Carbon nanotubes and Nanoribbons. An introduction to the electron transport properties in nanostructures is also provides.